Ten years of research and development have refined a coating process so good that it out performs existing technology by up to 80%.
IMPT’s ESAVD-Layatec™ process coats high performance materials onto a vast variety of substrates without the need to use any expensive vacuum, plasma or electron beam systems. The ESAVD-Layatec™ process works at atmospheric pressure and even in open air.
Thin and thick film coating processes no longer need to be an expensive complicated process.
The Invention
Layatec™ is an Electrostatic Spray Assisted Vapour Deposition (ESAVD) technique developed by Professor Choy’s team, which involves spraying atomised droplets across an electric field; the droplets undergo a controlled chemical reaction as they pass through the field and onto a heated substrate. The result is a stable solid film with excellent adhesion, produced in a simple open environment.
The Advantages
- Cost effective , safe and environmentally friendly process
- Simple and flexible production equipment with minimum maintenance
- Open air processing method without the use of a reactor or vacuum system
- Precise control of film microstructure , composition and thickness with high deposition efficiency (e.g. >80%)
Applications
ESAVD-Layatec™ is a tried and tested technique for
- Thermal Barrier Coatings
- ITO layers for Flat Panel Displays
- Functional layers for Photovoltaics
- Bio-compatible coatings for biomedical
ESAVD-Layatec™ is also perfect for the development of many exciting new products, for example:
- Coloured & Self-Cleaning glass
- Functional, Multilayer and Graded Coatings
- Nanocomposites
For more further information or to discuss implementing ESAVD-Layatec™ in your company please Contact IMPT , there are also a number of publications that detail the ESAVD process listed below:
1. Laying It On Thick And Thin - Kwang-Leong Choy - Materials World June 2003 Electrostatic spray-assisted vapour deposition (ESAVD), first reported in Materials World in March 1998, is an innovative and cost effective method for the fabrication of films and nanocrystalline powders. Here, the inventor of the process, Kwang-Leong Choy, describes further advances and applications for this novel process.
2. Choy, K. L. Process principles and applications of novel and cost-effective ESAVD based methods, in Innovative Processing of Films and Nanocrystalline Powders, K. L. Choy. ed. (World Scientific Publishing Company), 2002, 15-69. ISBN: 1860943160.
3. Choy, K. L. Review of advances in processing methods: films and nanocrystalline powders, in Innovative Processing of Films and Nanocrystalline Powders, Choy, K. L. ed. (Imperial College Press), 2002, 1-14. ISBN: 186094316
4. Choy, K. L., Progress in Materials Science, 48, 57(2003).
5. Choy, K. L., Vapor Processing of nanostructured materials, in Handbook of nanostructured materials and nanotechnology, Nalwa, H. S. ed. (Academic Press) 2000, 533. ISBN: 0-12-513760-5
6. Choy, K. L., Innovative and cost-effective deposition of coatings using ESAVD method, Surface Engineering, 16 (2000) 465.
7. R. Chandrasekhar and K. L. Choy, Electrostatic spray assisted vapour deposition of fluorine doped tin oxide, Journal of Crystal Growth, 231 (1-2) (2001) 215.
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